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Direct observation of a borane–silane complex involved in frustrated Lewis-pair-mediated hydrosilylations

机译:直接观察硼烷-硅烷配合物参与受阻的路易斯对介导的氢甲硅烷基化反应

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摘要

Perfluorarylborane Lewis acids catalyse the addition of silicon–hydrogen bonds across C=C, C=N and C=O double bonds. This ‘metal-free’ hydrosilylation has been proposed to occur via borane activation of the silane Si–H bond, rather than through classical Lewis acid/base adducts with the substrate. However, the key borane/silane adduct had not been observed experimentally. Here it is shown that the strongly Lewis acidic, antiaromatic 1,2,3-tris(pentafluorophenyl)-4,5,6,7-tetrafluoro-1-boraindene forms an observable, isolable adduct with ​triethylsilane. The equilibrium for adduct formation was studied quantitatively through variable-temperature NMR spectroscopic investigations. The interaction of the silane with the borane occurs through the Si–H bond, as evidenced by trends in the Si–H coupling constant and the infrared stretching frequency of the Si–H bond, as well as by X-ray crystallography and theoretical calculations. The adduct's reactivity with nucleophiles demonstrates conclusively the role of this species in metal-free ‘frustrated-Lewis-pair’ hydrosilylation reactions.
机译:全氟芳基硼烷路易斯酸催化跨C = C,C = N和C = O双键的硅氢键加成。有人提出这种“无金属”的氢化硅烷化反应是通过硅烷Si-H键的硼烷活化而不是通过与基材的经典路易斯酸/碱加合物发生的。但是,没有通过实验观察到关键的硼烷/硅烷加合物。此处显示强路易斯酸性,抗芳族1,2,3-三(五氟苯基)-4,5,6,7-四氟-1-硼丁烯与三乙基硅烷形成可观察到的,可分离的加合物。通过可变温度NMR光谱研究定量研究了加合物形成的平衡。硅烷与硼烷的相互作用是通过Si–H键发生的,Si–H耦合常数和Si–H键的红外拉伸频率的趋势以及X射线晶体学和理论计算证明了这一点。 。加合物与亲核试剂的反应性最终证明了该物种在无金属的“沮丧的刘易斯对”氢化硅烷化反应中的作用。

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